Principles of plasma discharges and materials processing

QRコード(所蔵情報)

フォーマット:

図書

責任表示:

Michael A. Lieberman, Allan J. Lichtenberg

言語:

英語

出版情報:

Hoboken, N.J. : Wiley-Interscience, c2005

形態:

xxxv, 757 p. : ill. ; 25 cm

著者名:

書誌ID:

BA72469354

ISBN:

9780471720010 [0471720011]

子書誌情報

所蔵情報

タイトル・著者・出版者が同じ資料

詳細

主題:	Plasma chemistry--Industrial applications; Plasma dynamics; Plasma etching; Thin films--Surfaces
分類・件名:	LCC : QC718.5.D9 DC22 : 530.4/4 LCSH : Plasma dynamics LCSH : Thin films -- Surfaces LCSH : Plasma etching LCSH : Plasma chemistry -- Industrial applications
LCCN:	2004058503
注記:	Includes bibliographical references (p. 735-748) and index
TTLL:	eng

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1 図書 Principles of plasma discharges and materials processing Lieberman, M. A. (Michael A.), Lichtenberg, Allan J Wiley	7 図書 The Application of plasmas to chemical processing Baddour, Raymond F., Timmins, Robert S. M.I.T. Press
2 電子ブック Principles of Plasma Discharges and Materials Processing Lieberman, Michael A., Lichtenberg, Alan J., Lichtenberg, Allan J. John Wiley & Sons, Inc.	8 図書 Applications of plasma processes to VLSI technology 菅野, 卓雄(1931-) Wiley
3 図書 Glow discharge processes : sputtering and plasma etching Chapman, Brian N. Wiley	9 図書 Plasma etching : an introduction Manos, Dennis M., Flamm, Daniel L. Academic Press
4 図書 Regular and chaotic dynamics Lichtenberg, Allan J, Lieberman, M. A. (Michael A.) Springer-Verlag	10 図書 Physics of intense beams in plasmas Nezlin, M. V. (Mikhail Veniaminovich) Institute of Physics Pub.
5 図書 Regular and stochastic motion Lichtenberg, Allan J., Lieberman, M. A. (Michael A.) Springer-Verlag	11 図書 Basic data of plasma physics : the fundamental data on electrical discharges in gases Brown, Sanborn Conner, 1913- American Institute of Physics
6 図書 Lecture notes on principles of plasma processing Chen, Francis F., 1929-, Chang, Jane P., 1970- Kluwer Academic/Plenum Publishers	12 図書 Waves and interactions in solid state plasmas Platzman, P. M., Wolff, Peter A., 1923- Academic Press