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Formation of crystalline silicon films having nanometer-size grains using a plasma-enhanced chemical vapor deposition technique

フォーマット:
図書
責任表示:
Atif Mossad Ali[著]
言語:
英語
出版情報:
[金沢] : [Atif Mossad Ali] , [2001]
形態:
1冊 ; 30cm
著者名:
Ali, Atif Mossad  
書誌ID:
BA81810361
子書誌情報
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