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論文 |
論文
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黒部, 利次 ; 今中, 治 ; 坂谷, 勝明
概要:
New finishing method has been developed by using the electrophoresis phenomenon of fine grain suspehded in liquid, which yields the electrical double layer at the surface of the grain. When the electric power is supplied to electrode set
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into the polishing compound, the grain moves and causes the polishing action to the workpiece surface.- The developed polishing equipment consists of a rotary vessel containing the polishing agent. The experiments were conducted on silicon wafer and ferrous metal specimen using the distilled water or ethylalcohol mixed with fine abrasive grain (Al2O3, SiO2) at the 10-2% volume concentration. The experimental results on the silicon wafer which is placed apart from the electrode showed that the stock removal rate increases with increasing the applied potential. Examination of the surface profile of the polished specimen indicated that the surface roughness decreases with increasing the potential. It can be said that the surface finishing characteristics are controllable by varying the current to the electrode.
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| 2.
論文 |
論文
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坂谷, 勝明 ; 黒部, 利次 ; 鈴木, 繁成 ; 廣崎, 憲一
概要:
A new type of field-assisted fine polishing method for brittle materials has been proposed, which is developed for applying to the polishing on NC grinding machine without the vessel for polishing compound. In this method, the
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non-contact type polishing is realized with fluid grinding wheel which is covered with thick magnetic fluid film holding the abrasive grain. In this report, the surface polishing experiments are conducted on silicon wafers and the polishing characteristics are examined. The following results are obtained : (1) When the clearance between the polisher and the work surface exceeds the definite value, the polishing rate decreases extremely. (2) The use of water based magnetic fluid yields lower polishing rate but smoother surface in comparison with kerosene based magnetic fluid. (3) The surface roughness of polished surface basically depends on grain size and the roughness of the order of nanometers is obtained with fine abrasive grain.
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| 3.
論文 |
論文
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坂谷, 勝明 ; 黒部, 利次 ; 戸島, 靖 ; 廣崎, 憲一
概要:
Efficient fine finishing of optical glass has been conducted by using a newly-developed setup which realizes the finishing of the non-contact type polishing with tin wheel floating by the effect of fluid lubrication. The
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polishing is made by using an electrophoresis phenomenon of fine grain in the water. when the electric power of DC voltage is supplied to the tin wheel rotating in the polishing compound, the grain concentrates on the wheel surface and causes the grinding action in a sense to the workpiece surface Experimental results show that the stock removal rate increases after first decreasing with the applied potential. It is found, however, that applied current intensity has little effect on the stock removal. The characteristics of polished surface have been exmined by AFM. The microtopography of the surface polished with fine abrasive grain indicates that the surface roughness of the order of nanometers is obtained even in the case that high voltage is supplied.
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